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AIXTRON SE

Booth number: North Hall D, 1114

www.aixtron.com
info@aixtron.com

About us

AIXTRON is a leading supplier of deposition equipment to the semiconductor industry. The Company's technology solutions are used by customers worldwide, enabling them to build advanced components for electronic and opto-electronic applications based on compound, silicon, or organic semiconductor materials, for polymers, carbon nanotubes, graphene, and other nanomaterials.

For the deposition of organic thin films, AIXTRON offers three core technologies for mass production and R&D:
- Organic Vapor Phase Deposition (OVPD®) enables the deposition of organic small molecules for OLEDs and organic semiconductors.
- Polymer Vapor Phase Deposition (PVPD®) provides a modular solution for carrier gas enhanced vapor phase deposition of functional polymer thin films.
- OptaCap scalable PECVD approach using prorpietary linear source approach for the deposition of highly flexible barrier films.



Products and services

- Organic Vapor Phase Deposition (OVPD®) enables the deposition of organic small molecules for OLEDs and organic semiconductors.

- Polymer Vapor Phase Deposition (PVPD®) provides a solution for carrier gas enhanced vapor phase deposition of functional polymer thin films.

- OPTACAP Process Technology: Plasma-enhanced chemical vapor phase Deposition (PECVD) approach with proprietary linear source technology for highly flexible barrier films.

OPTACAP™ Barrier Deposition Systems for Organic Electronics

OPTACAP™ Barrier Deposition Systems for Organic Electronics

Innovative low temperature process technology based on a scalable, linear PECVD approach, optimized for the deposition of highly flexible and effective silicon nitride inorganic barrier films. Ideal for deposition on glass and plastic substrates.

Applications: OLED displays + OLED lighting, PV, flexible electronics etc.


OVPD-200 for 200 X 200 mm2 substrate
OVPD-470 for 470 X 370 mm2 substrate

Prepared for cluster connection and automation, integrated mask handling with precision alignment

OVPD® (Organic Vapor Phase Deposition)

OVPD® (Organic Vapor Phase Deposition)

Thinfilm deposition systems for organic electronics.

OVPD® enables the deposition of organic small molecules for OLEDs and other organic semiconductors.

Applications: displays, lighting, solar cells, transistors etc.

Substrate sizes from Gen1 (200 x 200 mm²) to Gen8 (2.200 x 2.500 mm²)

The OVPD-200 model was developed for R&D purposes. Its modular configuration allows the integration in cluster environments with capabilities matching the specific requirements.

PRODOS (Polymer Vapor Phase Deposition)

PRODOS (Polymer Vapor Phase Deposition)

Carrier gas enhanced CVD method to deposit polymer thinfilms from vapor phase.

Examples for polymer films: dielectric/conductive films, hydrophobic/oleophobic behavior, planarization, etc.

Substrate sizes: Gen1 (200x200 mm²) to Gen8
Substrate types: glass substrate or flexible substrate laminated to glass carrier.

The PRODOS-200 (200x200 mm²) was developed especially for R&D purposes. In combination with the OEC-200 components it can be integrated in automated cluster configurations.

Contacts

Address
AIXTRON SE
Dornkaulstr. 2
52134 Herzogenrath
Germany

Phone: +49 2407 9030-0

Juergen Kreis
Director Business Development
Phone: +49 2407 9030-6986
j.kreis@aixtron.com


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CYNORA GmbH
Booth number: North Hall D, 1013